Specialty Gas
CH3F / Methyl Fluoride / HFC-41 / Electronic gas
Methyl Fluoride (CH3F) is an environmentally friendly dry etching gas with low GWP, showing very high performance in etching process of semiconductor and electronic products
CH3F Molecular Structure
· Production Description
· Packaging Information: 4.64L/10.2L/44L Cylinder
| Items | Specification |
| Chemical Name | Methyl Fluoride Freon 41,HFC-41, R-41 |
| Chemical formula | CH3-F |
| Molecular formula | CH3F |
| CAS No. | 593-53-3 |
| Molecular weight (g/mol) | 34.03 |
| ODP | 0 |
| GWP100 yr | 150 |
| Purity | ≥99.0% |
· Typical Physical or Chemical Properties
| Attributes | Values |
| Chemical Name | Methyl Fluoride Freon 41, HFC-41, R-41 |
| Boiling point (℃) | -78.4 |
| Freezing point (℃) | -142 |
| Critical temperature (℃) | 44.5 |
| Relative gas density (air = 1) | 1.2 |
| Relative liquid density (water = 1) | 0.61 |
| Vapor pressure (kPa, @21℃) | 3300 |
| Explosion limits (%vol) | 2.6-21.7 |